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High purity tungsten target,Lithium Nniobate Sputtering Target

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【High-quality optoelectronic materials/high-purity 】>>>【Sputtering target】

Ultra High Purity Material Manufacturer

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Product Description

Application:

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

 

Specification:

Name

 Molecular formula Specification

Size

 Relative density Grain size Defect rate
Tungsten target

W

4N(99.99%)

 Inch

mm

≥99%

≯50µm

0

5N(99.999%)

D(2,3,4,6,8,10,12)

H(0.25,0.5,0.75)

Diameter 50～350

Thickness 6～25
Tungsten Titanium Target

WTi10

WTi20

4N(99.99%)

≥99%

≯50µm

0

4N5(99.995%)

 

Chemical component

           Specification grade

Chemical index

 W/(W+Ti)≥99.99%

 W/(W+Ti)≥99.995%

 W≥99.999%
Total trace impurities

≯100 ppm

≯50 ppm

≯10 ppm

Impurity index(ppm)

Max

 Typical value Max Typical value Max Typical value

Radioactive elements

U

—

0.2

0.1

0.05

0.0008

0.0005

Th

—

0.2

0.1

0.05

0.0008

0.0005

Alkali metal elements

Li

1

0.05

0.02

0.01

0.01

0.003

Na

5

1

0.5

0.2

0.1

0.05

K

5

1

0.1

0.05

0.05

0.03

Mo，Re

10

5

10

5

1

0.5

Fe，Cr

10

5

5

3

0.5

0.3

Ca，Si，Cu，Ni，Al，Zn，Sn，Mn，Co，Hg，V

2

1

0.5

0.3

0.2

0.2

P，As，Se

2

1

0.5

0.2

0.2

0.2

B，Pb，Sb，Be，Ba，Bi，Cd，Ge，Nb，Pt，Mg，Zr，Au，In，Ga，Ag

1

0.5

0.5

0.1

0.1

0.1
All other individual elements

1

0.5

0.5

0.1

0.1

0.1

Gas analysis

（≯，ppm）

O

C

N

H

S

30

20

20

20

10

 

Depending on the purpose of use, there are different requirements for the impurity content of high-purity tungsten targets and tungsten-titanium targets. Generally, the chemical purity is required to be between 99.99% and 99.999%. We can also customize other specifications suitable for the application according to user requirements.

 

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