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Perrhenic Acid,Cobalt Tantalum Zirconium Sputtering Target

Ultra High Purity Material Manufacturer

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86 13823152377

Product Description

Appearance: Colorless transparent liquid

Application: Used for making rhenium compound and Pt/Re bimetallic reforming catalysts.

Chemical Specification: 99.99% purity, Total impurity content≤100ppm. Re concentration 60-90g/L (Remark:impurities content same as 4N grade APR)

Typical chemical analysis

Impurities Trace impurities(%,max)
Element Value Element Value Element Value Element Value
Na 0.0010 Ti 0.0001 Ni 0.0001 Sn 0.0001
Mg 0.0001 V 0.0001 Cu 0.0001 Sb 0.0001
Al 0.0001 Cr 0.0001 Zn 0.0001 Ta 0.0001
Si 0.0005 Mn 0.0001 As 0.0001 W 0.0005
P 0.0001 Fe 0.0005 Zr 0.0001 Pb 0.0001
K 0.0010 Co 0.0001 Mo 0.0005 Bi 0.0001
Ca 0.0005 Se 0.0001 Cd 0.0001 Tl 0.0001